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HARVARD Citation
Vervaele, M. et al. (2017). A Novel Direct Liquid Injection Low Pressure Chemical Vapor Deposition System (DLI‐LPCVD) for the Deposition of Thin Films1 . Advanced engineering materials. 19 (8), p. n/a. [Online].
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Vervaele, M. et al. (2017). A Novel Direct Liquid Injection Low Pressure Chemical Vapor Deposition System (DLI‐LPCVD) for the Deposition of Thin Films1 . Advanced engineering materials. 19 (8), p. n/a. [Online].