Modulating the Work Function of Graphene by Pulsed Plasma Aided Controlled Chlorination. Issue 1 (December 2018)

• Record Type: Journal Article
• Authors: Takehira, Hiroshi; Karim, Mohammad; Shudo, Yuta; Fukuda, Masahiro; Mashimo, Tsutomu; Hayami, Shinya
• Is Part Of: Scientific reports. Volume 8:Issue 1(2018)
• Page Start: 1
• Page End: 8
• Publication Date: 2018-12
• Subjects: Natural history -- Research -- Periodicals; Biology -- Research -- Periodicals; Physical sciences -- Research -- Periodicals; Earth sciences -- Research -- Periodicals; Environmental sciences -- Research -- Periodicals; 502.85
• DOI: 10.1038/s41598-018-35668-x
• Languages: English
• ISSNs: 2045-2322

Abstract

Abstract Chlorine on graphene (G) matrices was doped by pulsed plasma stimulation on graphite electrode submerged in organochlorine solvents (CH2 Cl2, CHCl3, CCl4 ). The study of work function by Kelvin probe force microscopy (KPFM) measurement clearly indicates that Cl-doped G behave like semiconductor and GG@CHCl3 exhibits the lowest value for the work function. We propose that this report not only represents a new route for tuning the semiconductivity of G but also indicates that doping level of halogen on G based carbon framework can be controlled by pulsed plasma treatment of carbon materials on various organohalogen derivatives.