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HARVARD Citation
Zhu, H. et al. (n.d.). Total dose effect of Al2O3-based metal–oxide–semiconductor structures and its mechanism under gamma-ray irradiation. Semiconductor science and technology. p. . [Online].
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Zhu, H. et al. (n.d.). Total dose effect of Al2O3-based metal–oxide–semiconductor structures and its mechanism under gamma-ray irradiation. Semiconductor science and technology. p. . [Online].