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HARVARD Citation
Wang, J. et al. (n.d.). A model for etching of three-dimensional high aspect ratio silicon structures in pulsed inductively coupled plasmas. Plasma sources science & technology. p. . [Online].
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Wang, J. et al. (n.d.). A model for etching of three-dimensional high aspect ratio silicon structures in pulsed inductively coupled plasmas. Plasma sources science & technology. p. . [Online].