Cite
HARVARD Citation
Shin, J. et al. (2018). Atomic layer deposited high-k dielectric on graphene by functionalization through atmospheric plasma treatment. Nanotechnology. p. . [Online].
This is an interim version of our Electronic Legal Deposit Catalogue-eJournals and eBooks while we continue to recover from a cyber-attack.
Shin, J. et al. (2018). Atomic layer deposited high-k dielectric on graphene by functionalization through atmospheric plasma treatment. Nanotechnology. p. . [Online].