Spatial distribution of Ti vapor admixture ratio in Ar induction thermal plasma torch during Ti feedstock injection. (15th February 2018)

• Record Type: Journal Article
• Authors: Kodama, Naoto; Tanaka, Yasunori; Ishisaka, Yosuke; Shimizu, Kotaro; Uesugi, Yoshihiko; Ishijima, Tatsuo; Watanabe, Shu; Sueyasu, Shiori; Nakamura, Keitaro
• Is Part Of: Japanese journal of applied physics. Volume 57:Number 3(2018)
• Publication Date: 2018-02-15
• Subjects: Physics -- Periodicals; 621.05
• DOI: 10.7567/JJAP.57.036101
• Languages: English
• ISSNs: 0021-4922

Abstract

Abstract: The spatial distribution of the Ti vapor admixture ratio ( X Ti ) was determined together with Ti excitation temperature ( ) from two-dimensional (2D) optical emission spectroscopy (OES) during Ti feedstock injection into an Ar induction thermal plasma (ICTP) torch for Ti nanoparticle synthesis. The X Ti is one important parameter affecting ICTP properties such as its electrical conductivity. The value of X Ti was estimated from the radiation intensity ratio of the Ar atomic line to the Ti atomic line, and obtained from 2D OES observation. Furthermore the electron density ( n e ) was also determined from the estimated results of and X Ti through the equilibrium composition. These 2D OES results revealed as 2500–4000 K at around the central axis of the ICTP torch, although it was higher than 4000 K in the off-axis region. In the off-axis region, X Ti and n e were much higher than in the on-axis region.