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HARVARD Citation
Tahara, D. et al. (2017). Stoichiometric control for heteroepitaxial growth of smooth ε-Ga2O3 thin films on c-plane AlN templates by mist chemical vapor deposition. Japanese journal of applied physics. p. . [Online].
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Tahara, D. et al. (2017). Stoichiometric control for heteroepitaxial growth of smooth ε-Ga2O3 thin films on c-plane AlN templates by mist chemical vapor deposition. Japanese journal of applied physics. p. . [Online].