Cite
HARVARD Citation
Han, J. et al. (2017). Improved PECVD SixNy film as a mask layer for deep wet etching of the silicon. Materials research express. p. . [Online].
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Han, J. et al. (2017). Improved PECVD SixNy film as a mask layer for deep wet etching of the silicon. Materials research express. p. . [Online].