Microplasma device architectures with various diamond nanostructures. (1st February 2017)
- Record Type:
- Journal Article
- Title:
- Microplasma device architectures with various diamond nanostructures. (1st February 2017)
- Main Title:
- Microplasma device architectures with various diamond nanostructures
- Authors:
- Kunuku, Srinivasu
Sankaran, Kamatchi Jothiramalingam
Leou, Keh-Chyang
Lin, I-Nan - Abstract:
- Abstract: Diamond nanostructures (DNSs) were fabricated from three different morphological diamonds, microcrystalline diamond (MCD), nanocrystalline diamond (NCD), and ultrananocrystalline diamond (UNCD) films, using a reactive ion etching method. The plasma illumination (PI) behavior of microplasma devices using the DNSs and the diamond films as cathode were investigated. The Paschen curve approach revealed that the secondary electron emission coefficient ( γ value) of diamond materials is similar irrespective of the microstructure (MCD, NCD, and UNCD) and geometry of the materials (DNSs and diamond films). The diamond materials show markedly larger γ -coefficient than conventional metallic cathode materials such as Mo that resulted in markedly better PI behavior for the corresponding microplasma devices. Moreover, the PI behavior, i.e. the voltage dependence of plasma current density ( J pl − V ), plasma density ( n e − V ), and the robustness of the devices, varied markedly with the microstructure and geometry of the cathode materials that was closely correlated to the electron field emission (EFE) properties of the cathode materials. The UNCD nanopillars, possessing good EFE properties, resulted in superior PI behavior, whereas the MCD diamond films with insufficient EFE properties led to inferior PI behavior. Consequently, enhancement of plasma characteristics is the collective effects of EFE behavior and secondary electron emission characteristics of diamond-basedAbstract: Diamond nanostructures (DNSs) were fabricated from three different morphological diamonds, microcrystalline diamond (MCD), nanocrystalline diamond (NCD), and ultrananocrystalline diamond (UNCD) films, using a reactive ion etching method. The plasma illumination (PI) behavior of microplasma devices using the DNSs and the diamond films as cathode were investigated. The Paschen curve approach revealed that the secondary electron emission coefficient ( γ value) of diamond materials is similar irrespective of the microstructure (MCD, NCD, and UNCD) and geometry of the materials (DNSs and diamond films). The diamond materials show markedly larger γ -coefficient than conventional metallic cathode materials such as Mo that resulted in markedly better PI behavior for the corresponding microplasma devices. Moreover, the PI behavior, i.e. the voltage dependence of plasma current density ( J pl − V ), plasma density ( n e − V ), and the robustness of the devices, varied markedly with the microstructure and geometry of the cathode materials that was closely correlated to the electron field emission (EFE) properties of the cathode materials. The UNCD nanopillars, possessing good EFE properties, resulted in superior PI behavior, whereas the MCD diamond films with insufficient EFE properties led to inferior PI behavior. Consequently, enhancement of plasma characteristics is the collective effects of EFE behavior and secondary electron emission characteristics of diamond-based cathode materials. … (more)
- Is Part Of:
- Materials research express. Volume 4:Number 2(2017)
- Journal:
- Materials research express
- Issue:
- Volume 4:Number 2(2017)
- Issue Display:
- Volume 4, Issue 2 (2017)
- Year:
- 2017
- Volume:
- 4
- Issue:
- 2
- Issue Sort Value:
- 2017-0004-0002-0000
- Page Start:
- Page End:
- Publication Date:
- 2017-02-01
- Subjects:
- diamond nanostructures -- microplasma -- electron field emission -- secondary electron emission -- plasma illumination
Materials science -- Research -- Periodicals
Materials science -- Periodicals
620.11 - Journal URLs:
- http://ioppublishing.org/ ↗
http://iopscience.iop.org/2053-1591/ ↗ - DOI:
- 10.1088/2053-1591/4/2/025001 ↗
- Languages:
- English
- ISSNs:
- 2053-1591
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 11094.xml