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HARVARD Citation
Onaka-Masada, A. et al. (2018). Effect of low-oxygen-concentration layer on iron gettering capability of carbon-cluster ion-implanted Si wafer for CMOS image sensors. Japanese journal of applied physics. p. . [Online].
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Onaka-Masada, A. et al. (2018). Effect of low-oxygen-concentration layer on iron gettering capability of carbon-cluster ion-implanted Si wafer for CMOS image sensors. Japanese journal of applied physics. p. . [Online].