Sub-10 nm patterning with DNA nanostructures: a short perspective. (10th October 2017)

• Record Type: Journal Article
• Authors: Du, Ke; Park, Myeongkee; Ding, Junjun; Hu, Huan; Zhang, Zheng
• Is Part Of: Nanotechnology. Volume 28:Number 44(2017)
• Publication Date: 2017-10-10
• Subjects: DNA nanostructure -- nanolithography -- sub-10 nm -- nanomanufacturing; Nanotechnology -- Periodicals; Nanotechnology -- Periodicals; Nanotechnology; Publications périodiques; Nanotechnologies; Periodicals; 620.5
• DOI: 10.1088/1361-6528/aa8a28
• Languages: English
• ISSNs: 0957-4484

Abstract

Abstract: DNA is the hereditary material that contains our unique genetic code. Since the first demonstration of two-dimensional (2D) nanopatterns by using designed DNA origami ∼10 years ago, DNA has evolved into a novel technique for 2D and 3D nanopatterning. It is now being used as a template for the creation of sub-10 nm structures via either 'top-down' or 'bottom-up' approaches for various applications spanning from nanoelectronics, plasmonic sensing, and nanophotonics. This perspective starts with an histroric overview and discusses the current state-of-the-art in DNA nanolithography. Emphasis is put on the challenges and prospects of DNA nanolithography as the next generation nanomanufacturing technique.