NbN superconducting nanonetwork fabricated using porous silicon templates and high-resolution electron beam lithography. (20th October 2017)

• Record Type: Journal Article
• Authors: Salvato, M; Baghdadi, R; Cirillo, C; Prischepa, S L; Dolgiy, A L; Bondarenko, V P; Lombardi, F; Attanasio, C
• Is Part Of: Nanotechnology. Volume 28:Number 46(2017)
• Publication Date: 2017-10-20
• Subjects: porous silicon -- electron beam lithography -- one-dimensional superconductivity -- quantum phase slips; Nanotechnology -- Periodicals; Nanotechnology -- Periodicals; Nanotechnology; Publications périodiques; Nanotechnologies; Periodicals; 620.5
• DOI: 10.1088/1361-6528/aa8479
• Languages: English
• ISSNs: 0957-4484

Abstract

Abstract: Superconducting NbN nanonetworks with a very small number of interconnected nanowires, with diameter of the order of 4 nm, are fabricated combining a bottom-up (use of porous silicon nanotemplates) with a top-down technique (high-resolution electron beam lithography). The method is easy to control and allows the fabrication of devices, on a robust support, with electrical properties close to a one-dimensional superconductor that can be used fruitfully for novel applications.