Growth and characterisation of ferromagnetic and antiferromagnetic Fe2+xVyAl Heusler alloy films. (13th July 2018)

• Record Type: Journal Article
• Authors: Huminiuc, Teodor; Whear, Oliver; Takahashi, Tomoyuki; Kim, Jun-young; Vick, Andrew; Vallejo-Fernandez, Gonzalo; O'Grady, Kevin; Hirohata, Atsufumi
• Is Part Of: Journal of physics. Volume 51:Number 32(2018)
• Publication Date: 2018-07-13
• Subjects: Heusler alloys -- spintronics -- sputtering -- x-ray diffraction -- Fe2VAl -- antiferromagnet -- exchange bias; Physics -- Periodicals; 530
• DOI: 10.1088/1361-6463/aacf4c
• Languages: English
• ISSNs: 0022-3727

Abstract

Abstract: We investigated growth, annealing conditions and magnetic properties of the Heusler alloy Fe2+ x V y Al by means of x-ray diffraction, magnetic hysteresis and exchange-bias measurements. Ferromagnetic Heusler alloy films were obtained by sputtering Fe2 VAl and Fe3 VAl targets and performing post-growth annealing. The characteristic (2 2 0) Heusler alloy peaks were seen in the x-ray diffraction measurements and corresponding ferromagnetic behaviours were observed. In addition, antiferromagnetic Heusler alloy films were deposited by employing Al pegs on Fe3 VAl sputtering targets. The deposited films had elemental ratios close to the predicted Fe2.5 V0.5 Al phase, and a 16 Oe exchange-bias was measured in a Fe2.3 V0.7 Al/Co60 Fe40 system at 100 K.