Phase shifting mask modulated laser patterning on graphene. (16th December 2016)

• Record Type: Journal Article
• Authors: Gao, Fan; Liu, Fengyuan; Ye, Ziran; Sui, Chenghua; Yan, Bo; Cai, Pinggen; Lv, Bin; Li, Yun; Chen, Naibo; Zheng, Youdou; Shi, Yi
• Is Part Of: Nanotechnology. Volume 28:Number 4(2017)
• Publication Date: 2016-12-16
• Subjects: monolayer graphene -- phase shifting mask -- laser patterning; Nanotechnology -- Periodicals; Nanotechnology -- Periodicals; Nanotechnology; Publications périodiques; Nanotechnologies; Periodicals; 620.5
• DOI: 10.1088/1361-6528/28/4/045304
• Languages: English
• ISSNs: 0957-4484

Abstract

Abstract: A one-step graphene patterning method is developed in this paper. A phase shifting mask is used to modulate incident laser beam spatially and generate graphene patterns by laser heating. Periodic graphene nanoribbon and nanomesh structures are fabricated by employing 1D and 2D phase shifting masks, respectively. The noncontact, simple procedure, easy handling and economic properties of this method make it promising towards graphene-based device fabrication.