Low-temperature atomic layer deposition of Al2O3/alucone nanolaminates for OLED encapsulation. Issue 36 (4th July 2019)

• Record Type: Journal Article
• Authors: Chen, Guixiong; Weng, Yalian; Sun, Fan; Zhou, Xiongtu; Wu, Chaoxing; Yan, Qun; Guo, Tailiang; Zhang, Yongai
• Is Part Of: RSC advances. Volume 9:Issue 36(2019)
• Page Start: 20884
• Page End: 20891
• Publication Date: 2019-07-04
• Subjects: Chemistry -- Periodicals; 540.5
• DOI: 10.1039/c9ra02111f
• Languages: English
• ISSNs: 2046-2069

Abstract

Abstract : Al2 O3 /alucone laminates were fabricated by atomic layer deposition (ALD) and molecular layer deposition (MLD), showing good barrier properties. These laminates were found to prolong the lifetime of organic light-emitting diodes (OLEDs) evidently. Abstract : Thin film encapsulation (TFE) is one of the key problems that hinders the lifetime and widespread commercialization of flexible organic light-emitting diodes (OLEDs). In this work, TFE of OLEDs with Al2 O3 /alucone laminates grown by atomic layer deposition (ALD) and molecular layer deposition (MLD) as moisture barriers were demonstrated. The barrier performances of Al2 O3 /alucone laminates with respect to the individual layer thickness and the number of dyads were investigated. It was found that alucone with suitable layer thickness could reduce the permeation to the defect zones of the inorganic layer by prolonging the permeation pathway, sequentially improving the moisture barrier performance. The water vapor transmission rate (WVTR) could be further lowered with increasing the number of dyads of the laminates, the WVTR value reached 1.44 × 10 −4 g per m 2 per day for laminates with 5.5 dyads. These laminates were incorporated in OLEDs with pixel define layer (PDL), and were found to be able to evidently prolong the lifetime of the OLED.