Cite
HARVARD Citation
Li, Y. et al. (2018). Tensilely Strained Ge Films on Si Substrates Created by Physical Vapor Deposition of Solid Sources. Scientific reports. 8 (1), pp. 1-6. [Online].
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Li, Y. et al. (2018). Tensilely Strained Ge Films on Si Substrates Created by Physical Vapor Deposition of Solid Sources. Scientific reports. 8 (1), pp. 1-6. [Online].