Ultrananocrystalline diamond coatings for the dental implant: electrochemical nature. Issue 2 (12th April 2017)

• Record Type: Journal Article
• Authors: Patel, Bhavani; Duran-Martinez, Adriana C.; Gurman, Pablo; Auciello, Orlando; Barao, Valentim; Campbell, Stephan; Sukotjo, Cortino; Mathew, Mathew T.
• Is Part Of: Surface innovations. Volume 5:Issue 2(2017:Jun.)
• Page Start: 106
• Page End: 117
• Publication Date: 2017-04-12
• Subjects: biomaterials -- corrosion -- implant; Surfaces (Technology) -- Periodicals; Surfaces (Physics) -- Periodicals; 620.44
• DOI: 10.1680/jsuin.16.00023
• Languages: English
• ISSNs: 2050-6260

Abstract

Abstract : Titanium (Ti) and its alloys are currently used as biomaterials for dental implants. However, titanium and its alloys suffer electrochemical corrosion in the oral environment. Ultrananocrystalline diamond (UNCD) coating is a promising coating material with exceptional biocompatibility, excellent osseointegration, high wear resistance and extreme resistance to chemical attack for producing a new generation of long-life dental implants. The main objective of this work was to investigate the basic electrochemical behavior of UNCD-coated samples of commercially pure titanium (Cp-Ti/Ti-2) and titanium alloy (Ti–6Al–4V/Ti-5) at three different pH conditions of artificial saliva. All titanium and titanium alloy samples of four groups were used: ( a ) control Ti-2, ( b ) UNCD-coated Ti-2, ( c ) control Ti-5 and ( d ) UNCD-coated Ti-5. For each group, electrochemical analysis was performed at pH 3, 6·5 and 9·0. In the electrochemical tests, the evolution of potential was higher in the UNCD-coated Ti-2 and UNCD-coated Ti-5 than in the uncoated samples. Potentiodynamic ( E corr, I corr ) and impedance measurements also showed improvement in the electrochemical behavior of both UNCD-coated titanium samples for all three pH conditions. These preliminary findings indicate that UNCD coatings could be considered for the next generation of the dental implants, to improve their performance.