Cite
HARVARD Citation
Singh, M. et al. (2018). Effect of Ar, O2, and N2 Plasma on the Growth and Composition of Vanadium Oxide Nanostructured Thin Films. Advanced materials interfaces. 5 (18), p. n/a. [Online].
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Singh, M. et al. (2018). Effect of Ar, O2, and N2 Plasma on the Growth and Composition of Vanadium Oxide Nanostructured Thin Films. Advanced materials interfaces. 5 (18), p. n/a. [Online].