Cite
HARVARD Citation
Omura, Y. (2015). Feasible Time Evolution Model That Predicts Breakdown in Thin SiO2 Films within Unstressed Interval after Constant-Current Stress. Advances in materials science and engineering. p. . [Online].
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Omura, Y. (2015). Feasible Time Evolution Model That Predicts Breakdown in Thin SiO2 Films within Unstressed Interval after Constant-Current Stress. Advances in materials science and engineering. p. . [Online].