Controlling Injection Barriers for Ambipolar 2D Semiconductors via Quasi‐van der Waals Contacts. Issue 11 (19th April 2019)
- Record Type:
- Journal Article
- Title:
- Controlling Injection Barriers for Ambipolar 2D Semiconductors via Quasi‐van der Waals Contacts. Issue 11 (19th April 2019)
- Main Title:
- Controlling Injection Barriers for Ambipolar 2D Semiconductors via Quasi‐van der Waals Contacts
- Authors:
- Wang, Junjun
Wang, Feng
Wang, Zhenxing
Cheng, Ruiqing
Yin, Lei
Wen, Yao
Zhang, Yu
Li, Ningning
Zhan, Xueying
Xiao, Xiangheng
Feng, Liping
He, Jun - Abstract:
- Abstract: Barriers that charge carriers experience while injecting into channels play a crucial role on determining the device properties of van der Waals semiconductors (vdWS). Among various strategies to control these barriers, inserting a graphene layer underneath bulk metal may be a promising choice, which is still lacking experimental verification. Here, it is demonstrated that graphene/metal hybrid structures can form quasi‐van der Waals contacts (q‐vdWC) to ambipolar vdWS, combining the advantages of individual metal and graphene contacts together. A new analysis model is adopted to define the barriers and to extract the barrier heights in ambipolar vdWS. The devices with q‐vdWC show significantly reduced Schottky barrier heights and thermionic field emission activation energies, ability of screening the influence from substrate, and Fermi level unpinning effect. Furthermore, phototransistors with these special contacts exhibit enhanced performances. The proposed graphene/metal q‐vdWC may be an effective strategy to approach the Schottky–Mott limit for vdWS. Abstract : Quasi‐van der Waals contacts (q‐vdWC) to ambipolar van der Waals semiconductors (vdWS) combine the advantages of individual metal and graphene contacts together. An analysis model is adopted to extract the barrier heights in ambipolar vdWS. The devices with q‐vdWC show significantly reduced SBH and E a, ability of screening the influence from substrate, Fermi level unpinning effect, and enhancedAbstract: Barriers that charge carriers experience while injecting into channels play a crucial role on determining the device properties of van der Waals semiconductors (vdWS). Among various strategies to control these barriers, inserting a graphene layer underneath bulk metal may be a promising choice, which is still lacking experimental verification. Here, it is demonstrated that graphene/metal hybrid structures can form quasi‐van der Waals contacts (q‐vdWC) to ambipolar vdWS, combining the advantages of individual metal and graphene contacts together. A new analysis model is adopted to define the barriers and to extract the barrier heights in ambipolar vdWS. The devices with q‐vdWC show significantly reduced Schottky barrier heights and thermionic field emission activation energies, ability of screening the influence from substrate, and Fermi level unpinning effect. Furthermore, phototransistors with these special contacts exhibit enhanced performances. The proposed graphene/metal q‐vdWC may be an effective strategy to approach the Schottky–Mott limit for vdWS. Abstract : Quasi‐van der Waals contacts (q‐vdWC) to ambipolar van der Waals semiconductors (vdWS) combine the advantages of individual metal and graphene contacts together. An analysis model is adopted to extract the barrier heights in ambipolar vdWS. The devices with q‐vdWC show significantly reduced SBH and E a, ability of screening the influence from substrate, Fermi level unpinning effect, and enhanced photoelectrical performances. … (more)
- Is Part Of:
- Advanced science. Volume 6:Issue 11(2019)
- Journal:
- Advanced science
- Issue:
- Volume 6:Issue 11(2019)
- Issue Display:
- Volume 6, Issue 11 (2019)
- Year:
- 2019
- Volume:
- 6
- Issue:
- 11
- Issue Sort Value:
- 2019-0006-0011-0000
- Page Start:
- n/a
- Page End:
- n/a
- Publication Date:
- 2019-04-19
- Subjects:
- ambipolar 2D semiconductors -- Fermi level pinning effect -- Schottky barrier -- substrate influence -- van der Waals heterostructures
Science -- Periodicals
505 - Journal URLs:
- http://onlinelibrary.wiley.com/journal/10.1002/(ISSN)2198-3844 ↗
http://onlinelibrary.wiley.com/ ↗ - DOI:
- 10.1002/advs.201801841 ↗
- Languages:
- English
- ISSNs:
- 2198-3844
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 10710.xml