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Król, K. et al. (2018). Influence of Atomic Layer Deposition Temperature on the Electrical Properties of Al/ZrO2/SiO2/4H‐SiC Metal‐Oxide Semiconductor Structures. Physica status solidi. 215 (13), p. n/a. [Online].
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Król, K. et al. (2018). Influence of Atomic Layer Deposition Temperature on the Electrical Properties of Al/ZrO2/SiO2/4H‐SiC Metal‐Oxide Semiconductor Structures. Physica status solidi. 215 (13), p. n/a. [Online].