Characterization of Latent 3D Laser Photoexposure Patterns in Photoresist Created by Direct Laser Writing. (2019)
- Record Type:
- Journal Article
- Title:
- Characterization of Latent 3D Laser Photoexposure Patterns in Photoresist Created by Direct Laser Writing. (2019)
- Main Title:
- Characterization of Latent 3D Laser Photoexposure Patterns in Photoresist Created by Direct Laser Writing
- Authors:
- Yulianto, Edy
Chatterjee, Subhashri
Mizeikis, Vygantas - Abstract:
- Abstract: We describe photoluminescence quenching method for use in characterizing 3D laser photoexposure patterns in photoresist recorded during direct laser writing prior to development. By scanning a focused laser beam through the exposed patterns in the photoresist, important features of the photoexposure patterns, such as their size and shape, and the exposure threshold can be determined.
- Is Part Of:
- Materials today. Volume 13:Part 1(2019)
- Journal:
- Materials today
- Issue:
- Volume 13:Part 1(2019)
- Issue Display:
- Volume 13, Issue 1, Part 1 (2019)
- Year:
- 2019
- Volume:
- 13
- Issue:
- 1
- Part:
- 1
- Issue Sort Value:
- 2019-0013-0001-0001
- Page Start:
- 149
- Page End:
- 153
- Publication Date:
- 2019
- Subjects:
- direct laser writing (DLW) -- photoluminescence (PL) -- photoexposure -- quenching -- threshold
Materials science -- Congresses -- Periodicals
620.1 - Journal URLs:
- http://www.sciencedirect.com/science/journal/22147853 ↗
http://www.sciencedirect.com/ ↗ - DOI:
- 10.1016/j.matpr.2019.03.205 ↗
- Languages:
- English
- ISSNs:
- 2214-7853
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 10609.xml