Cite
HARVARD Citation
Li, N. et al. (2019). Atomic Layer Deposition of Al2O3 Directly on 2D Materials for High‐Performance Electronics. Advanced materials interfaces. 6 (10), p. n/a. [Online].
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Li, N. et al. (2019). Atomic Layer Deposition of Al2O3 Directly on 2D Materials for High‐Performance Electronics. Advanced materials interfaces. 6 (10), p. n/a. [Online].