In Situ Chemical Oxidation of Ultrasmall MoOx Nanoparticles in Suspensions. (26th August 2012)

• Record Type: Journal Article
• Authors: Lee, Yun-Ju; Barrera, Diego; Luo, Kaiyuan; Hsu, Julia W. P.
• Other Names: Nadagouda Mallikarjuna Academic Editor.
• Is Part Of: Journal of nanotechnology. Volume 2012(2012)
• Publication Date: 2012-08-26
• Subjects: Nanotechnology -- Periodicals; Nanotechnology; Nanotechnology; Periodicals; Periodicals; 620.5
• DOI: 10.1155/2012/195761
• Languages: English
• ISSNs: 1687-9503

Abstract

Abstract : Nanoparticle suspensions represent a promising route toward low cost, large area solution deposition of functional thin films for applications in energy conversion, flexible electronics, and sensors. However, parameters such size, stoichiometry, and electronic properties must be controlled to achieve best results for the target application. In this report, we demonstrate that such control can be achieved via in situ chemical oxidation ofMoO x nanoparticles in suspensions. Starting from a microwave-synthesized suspension of ultrasmall (d ~ 2 nm)MoO x nanoparticles in n-butanol, we added H2 O2 at room temperature to chemically oxidize the nanoparticles. We systematically varied H2 O2 concentration and reaction time and found that they significantly affected oxidation state and work function ofMoO x nanoparticle films. In particular, we achieved a continuous tuning ofMoO x work function from 4.4 to 5.0 eV, corresponding to oxidation of as-synthesizedMoO x nanoparticle (20% Mo 6+ ) to essentially pure MoO3 . This was achieved without significantly modifying nanoparticle size or stability. Such precise control ofMoO x stoichiometry and work function is critical for the optimization ofMoO x nanoparticles for applications in organic optoelectronics. Moreover, the simplicity of the chemical oxidation procedure should be applicable for the development of other transition oxide nanomaterials with tunable composition and properties.