Atomic Layer Deposition for the Conformal Coating of Nanoporous Materials. (6th July 2006)

• Record Type: Journal Article
• Authors: Elam, Jeffrey W.; Xiong, Guang; Han, Catherine Y.; Wang, H. Hau; Birrell, James P.; Welp, Ulrich; Hryn, John N.; Pellin, Michael J.; Baumann, Theodore F.; Poco, John F.; Satcher, Joe H.
• Is Part Of: Journal of nanomaterials. Volume 2006(2006)
• Publication Date: 2006-07-06
• Subjects: Nanostructured materials -- Periodicals; Nanotechnology -- Periodicals; Nanomatériaux; Nanostructured materials; Nanotechnology; Nanostructures; Nanotechnology; Periodicals; Fulltext; Internet Resources; Periodicals; 620.115
• DOI: 10.1155/JNM/2006/64501
• Languages: English
• ISSNs: 1687-4110

Abstract

Abstract : Atomic layer deposition (ALD ) is ideal for applying precise and conformal coatings over nanoporous materials. We have recently usedALD to coat two nanoporous solids: anodic aluminum oxide (AAO ) and silica aerogels.AAO possesses hexagonally ordered pores with diametersd ∼ 40 nm and pore lengthL ∼ 70 microns. TheAAO membranes were coated byALD to fabricate catalytic membranes that demonstrate remarkable selectivity in the oxidative dehydrogenation of cyclohexane. AdditionalAAO membranes coated withALD Pd films show promise as hydrogen sensors. Silica aerogels have the lowest density and highest surface area of any solid material. Consequently, these materials serve as an excellent substrate to fabricate novel catalytic materials and gas sensors byALD .