Cite
HARVARD Citation
Liu, D. et al. (2017). Material removal model of chemical mechanical polishing for fused silica using soft nanoparticles. International journal of advanced manufacturing technology. 88 (9), pp. 3515-3525. [Online].
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Liu, D. et al. (2017). Material removal model of chemical mechanical polishing for fused silica using soft nanoparticles. International journal of advanced manufacturing technology. 88 (9), pp. 3515-3525. [Online].