Cite
HARVARD Citation
Schäfer, A. et al. (1977). UHV – Deposited Amorphous Tantalum and Tantalum–Nickel Films. Electrocomponent science and technology. pp. 29-35. [Online].
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Schäfer, A. et al. (1977). UHV – Deposited Amorphous Tantalum and Tantalum–Nickel Films. Electrocomponent science and technology. pp. 29-35. [Online].