Silicon Micromachining for High Performance Passive Structures at W Band. (2002)

• Record Type: Journal Article
• Authors: Guillon, B.; Grenier, K.; Parra, T.; Pons, P.; Cros, D.; Blondy, P.; Graffeuil, J.; Cazaux, J. L.; Plana, R.
• Is Part Of: Active and passive electronic components. Volume 25:Number 1(2002)
• Page Start: 113
• Page End: 122
• Publication Date: 2002
• Subjects: Electronics -- Periodicals; Passive components -- Periodicals; Electronic apparatus and appliances -- Periodicals; 621.381505
• DOI: 10.1080/08827510211278
• Languages: English
• ISSNs: 0882-7516

Abstract

Abstract : This paper presents a micromachined technology allowing the realization of very high aspect ratio millimeter-wave circuits. Appropriate 3D electromagnetic simulations based on the finite element method have been implemented to design the circuits. Coplanar transmission lines featuring loss level in the 2 dB range up to 105 GHz have been realized. An original silicon micromachined cavity using the whispering gallery modes properties has been realized achieving a quality factor close to 10, 000 range at 95 GHz.