NanoFab SIMS: High Spatial Resolution Imaging and Analysis Using Inert-Gas Ion Beams. (8th May 2019)

• Record Type: Journal Article
• Authors: Sijbrandij, Sybren; Lombardi, Alexander; Sireuil, Alain; Khanom, Fouzia; Lewis, Brett; Guillermier, Christelle; Runt, Doug; Notte, John
• Is Part Of: Microscopy today. Volume 27:Number 3(2019)
• Page Start: 22
• Page End: 27
• Publication Date: 2019-05-08
• Subjects: Helium ion microscopy, -- secondary electron (SE) imaging, -- neon ion SIMS, -- high spatial resolution analysis, -- NanoFab; Microscope and microscopy -- Periodicals; 502.8
• DOI: 10.1017/S1551929519000440
• Languages: English
• ISSNs: 1551-9295

Abstract

Abstract: Abstract: By combining a focused inert-gas ion beam instrument and a custom magnetic-sector mass spectrometer, high spatial resolution imaging and chemical analysis are provided within a single instrument. Sub-nanometer image resolution is achieved by secondary electron (SE) imaging, limited only by the probe-size of the primary beam, while the spatial resolution for chemical mapping obtained via secondary ion mass spectrometry (SIMS) is limited mainly by beam-sample interactions to about 10 nm. This article introduces the background behind this development, describes the instrument and its various operating modes, and presents examples of its applications.