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HARVARD Citation
Wu, L. et al. (2019). Investigation of band alignment between InAlAs and atomic-layer-deposited HfO2/Al2O3 by X-ray photoelectron spectroscopy. Applied physics express. p. . [Online].
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Wu, L. et al. (2019). Investigation of band alignment between InAlAs and atomic-layer-deposited HfO2/Al2O3 by X-ray photoelectron spectroscopy. Applied physics express. p. . [Online].