Linear control of the oxidation level on graphene oxide sheets using the cyclic atomic layer reduction technique. Issue 16 (9th April 2019)

• Record Type: Journal Article
• Authors: Mallick, Bikash Chandra; Hsieh, Chien-Te; Yin, Ken-Ming; Li, Jianlin; Ashraf Gandomi, Yasser
• Is Part Of: Nanoscale. Volume 11:Issue 16(2019)
• Page Start: 7833
• Page End: 7838
• Publication Date: 2019-04-09
• Subjects: Nanoscience -- Periodicals; Nanotechnology -- Periodicals; 620.505
• DOI: 10.1039/c8nr10118c
• Languages: English
• ISSNs: 2040-3364

Abstract

Abstract : Precise control of the oxidation level on graphene oxide (GO) sheets is still a big challenge. Abstract : Precise control of the oxidation level on graphene oxide (GO) sheets is still a big challenge. This work demonstrates a linear control of the surface oxidation level on GO sheets via an atomic layer reduction (ALR) technique at 100 and 150 °C. The oxygen stripping rate during ALR cycling was assessed at different operating temperatures: 0.055% per cycle (150 °C) and 0.028% per cycle (100 °C). It was shown that the optical band gap and the electrical conductivity can be linearly tuned by the ALR cycle number for graphene-like materials. This unique capability was not feasible when employing conventional synthesis routes ( e.g. thermal or chemical reduction) since these techniques only provide a stepwise control over the oxidation/reduction processes. The in situ oxidation level on GO materials can be accurately controlled through the ALR/atomic layer oxidation (ALO) cycle. Accordingly, the ALR/ALO cycle offers excellent reversibility for adjusting the chemical composition of graphene-like materials and tuning the optical and electronic properties of such nanomaterials.