Cite
HARVARD Citation
Schilirò, E. et al. (2019). Structural and electrical properties of AlN thin films on GaN substrates grown by plasma enhanced-Atomic Layer Deposition. Materials science in semiconductor processing. pp. 35-39. [Online].
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Schilirò, E. et al. (2019). Structural and electrical properties of AlN thin films on GaN substrates grown by plasma enhanced-Atomic Layer Deposition. Materials science in semiconductor processing. pp. 35-39. [Online].