Direct fabrication of C12A7 electride target and room temperature deposition of thin films with low work function. (23rd March 2017)

• Record Type: Journal Article
• Authors: Zou, Wenwei; Khan, Karim; Zhao, Xunna; Zhu, Chaoting; Huang, Jinhua; Li, Jia; Yang, Ye; Song, Weijie
• Is Part Of: Materials research express. Volume 4:Number 3(2017)
• Publication Date: 2017-03-23
• Subjects: C12A7 -- electride -- magnetron sputtering -- work function; Materials science -- Research -- Periodicals; Materials science -- Periodicals; 620.11
• DOI: 10.1088/2053-1591/aa63c7
• Languages: English
• ISSNs: 2053-1591

Abstract

Abstract: In this work, a high density (94%) and high electron concentration (2.3 × 10 20 cm −3 ) doped C12A7 electride ceramic target for magnetron sputtering was prepared by directly heating the C12A7 nano powder to above its melting point. The effects of the temperature on the electron concentration was explored. Furthermore, a smooth ( R q = 0.6 nm), high transparent and low work function (Φ = 2.9 eV) C12A7 electride thin film was deposited via magnetron sputtering. This result provides a suitable route for the fabrication of large-scale C12A7 electride film and has a bright prospect for application in optoelectronic devices.