Mechano-fluorochromic behavior of AEE polyurethane films and their high sensitivity to halogen acid gas. Issue 17 (26th March 2019)

• Record Type: Journal Article
• Authors: Wang, Kun; Wang, Meng; Lu, Hao; Liu, Beibei; Huang, Mingming; Yang, Jiping
• Is Part Of: RSC advances. Volume 9:Issue 17(2019)
• Page Start: 9517
• Page End: 9521
• Publication Date: 2019-03-26
• Subjects: Chemistry -- Periodicals; 540.5
• DOI: 10.1039/c8ra10486g
• Languages: English
• ISSNs: 2046-2069

Abstract

Abstract : (a) Polyurethanes with higher content of TABDAA2 presented better positive correlation between fluorescence and strain. (b) Sensing mechanism of STMPU-50 for detection of HCl. Abstract : Three polyurethanes with different contents of tetraaryl-buta-1, 3-diene derivatives in the soft segment (STMPU-25/STMPU-50/STMPU-75) have been synthesized and found to present aggregation-enhanced emission features. The fluorescence intensity of polymer films was greatly enhanced with increasing tensile stress. Also, polyurethanes with higher aggregation-induced emission fluorogen content had stronger mechano-fluorochromic behavior in the same tension state. Moreover, the resulting polyurethane films possessed high sensitivity for halogen acid gas, suggesting their potential applications in environmental monitoring fields.