Cite
HARVARD Citation
Hoskins, A. et al. (2019). The effect of ultrathin ALD films on the oxidation kinetics of SiC in high-temperature steam. Chemical engineering science. pp. 230-236. [Online].
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Hoskins, A. et al. (2019). The effect of ultrathin ALD films on the oxidation kinetics of SiC in high-temperature steam. Chemical engineering science. pp. 230-236. [Online].