Balancing Scattering Channels: A Panoscopic Approach toward Zero Temperature Coefficient of Resistance Using High‐Entropy Alloys. Issue 2 (8th November 2018)
- Record Type:
- Journal Article
- Title:
- Balancing Scattering Channels: A Panoscopic Approach toward Zero Temperature Coefficient of Resistance Using High‐Entropy Alloys. Issue 2 (8th November 2018)
- Main Title:
- Balancing Scattering Channels: A Panoscopic Approach toward Zero Temperature Coefficient of Resistance Using High‐Entropy Alloys
- Authors:
- Shafeie, Samrand
Guo, Sheng
Erhart, Paul
Hu, Qiang
Palmqvist, Anders - Abstract:
- Abstract: Designing alloys with an accurate temperature‐independent electrical response over a wide temperature range, specifically a low temperature coefficient of resistance (TCR), remains a big challenge from a material design point of view. More than a century after their discovery, Constantan (Cu–Ni) and Manganin (Cu–Mn–Ni) alloys remain the top choice for strain gauge applications and high‐quality resistors up to 473–573 K. Here, an average TCR is demonstrated that is up to ≈800 times smaller in the temperature range 5–300 K and >800 times smaller than for any of these standard materials over a wide temperature range (5 K < T < 1200 K). This is achieved for selected compositions of Al x CoCrFeNi high‐entropy alloys (HEAs), for which a strong correlation of the ultralow TCR is established with the underlying microstructure and its local composition. The exceptionally low electron–phonon coupling expected in these HEAs is crucial for developing novel devices, e.g., hot‐electron detectors, high‐ Q resonant antennas, and materials in gravitational wave detectors. Abstract : In the high‐entropy alloy system Al x CoCrFeNi, x is used as a "knob" to elucidate the connection between composition, electrical resistivity, Kondo scattering, and microstructure. Furthermore, x controls the type of microstructure formed inside a spinodal region, which in turn tunes the temperature coefficient of resistance from positive to negative over a wide temperature range though differentAbstract: Designing alloys with an accurate temperature‐independent electrical response over a wide temperature range, specifically a low temperature coefficient of resistance (TCR), remains a big challenge from a material design point of view. More than a century after their discovery, Constantan (Cu–Ni) and Manganin (Cu–Mn–Ni) alloys remain the top choice for strain gauge applications and high‐quality resistors up to 473–573 K. Here, an average TCR is demonstrated that is up to ≈800 times smaller in the temperature range 5–300 K and >800 times smaller than for any of these standard materials over a wide temperature range (5 K < T < 1200 K). This is achieved for selected compositions of Al x CoCrFeNi high‐entropy alloys (HEAs), for which a strong correlation of the ultralow TCR is established with the underlying microstructure and its local composition. The exceptionally low electron–phonon coupling expected in these HEAs is crucial for developing novel devices, e.g., hot‐electron detectors, high‐ Q resonant antennas, and materials in gravitational wave detectors. Abstract : In the high‐entropy alloy system Al x CoCrFeNi, x is used as a "knob" to elucidate the connection between composition, electrical resistivity, Kondo scattering, and microstructure. Furthermore, x controls the type of microstructure formed inside a spinodal region, which in turn tunes the temperature coefficient of resistance from positive to negative over a wide temperature range though different scattering mechanisms. … (more)
- Is Part Of:
- Advanced materials. Volume 31:Issue 2(2019)
- Journal:
- Advanced materials
- Issue:
- Volume 31:Issue 2(2019)
- Issue Display:
- Volume 31, Issue 2 (2019)
- Year:
- 2019
- Volume:
- 31
- Issue:
- 2
- Issue Sort Value:
- 2019-0031-0002-0000
- Page Start:
- n/a
- Page End:
- n/a
- Publication Date:
- 2018-11-08
- Subjects:
- electrical resistivity -- high‐entropy alloys -- Kondo scattering -- microstructure -- temperature coefficient of resistance
Materials -- Periodicals
Chemical vapor deposition -- Periodicals
620.11 - Journal URLs:
- http://onlinelibrary.wiley.com/journal/10.1002/(ISSN)1521-4095 ↗
http://onlinelibrary.wiley.com/ ↗ - DOI:
- 10.1002/adma.201805392 ↗
- Languages:
- English
- ISSNs:
- 0935-9648
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 0696.897800
British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 9616.xml