Corrosion inhibition behaviors of ZrNx thin films with varied N vacancy concentration. (April 2019)

• Record Type: Journal Article
• Authors: Pei, Chenrui; Deng, Lijun; Liu, Hongjin; He, Zhen; Xiang, Chengjie; Zhang, Sam; Sun, Deen
• Is Part Of: Vacuum. Volume 162(2019)
• Page Start: 28
• Page End: 38
• Publication Date: 2019-04
• Subjects: N vacancy concentration -- Corrosion inhibition -- EIS -- Quantum chemical calculations; Vacuum -- Periodicals; 621.55
• DOI: 10.1016/j.vacuum.2019.01.027
• Languages: English
• ISSNs: 0042-207X

Abstract

Abstract: Three sets of ZrNx films with varied N vacancy concentration (VN ) were sputter-deposited onto 304 stainless steel sheets and Si substrates by physical vapor deposition. The thin films were characterized using scanning electron microscope, glancing angle X-ray diffraction and X-ray photoelectron spectroscopy. Their corrosion inhibition behaviors were studied by the potentiodynamic measurements and electrochemical impedance spectroscopy in 3.5 wt% NaCl solution. The experimental results indicated that the corrosion inhibition efficiency was relevant to VN . The samples with VN near 0.3 had the best corrosion inhibition efficiency. The quantum chemical parameters (EHOMO, ELUMO ) were also calculated to evaluate the corrosion inhibition efficiency. The overall results showed that corrosion inhibition efficiency of ZrNx film was correlated to N vacancy concentration. Highlights: ZrNx films with varied VN have been conducted by experiments and first-principles calculation. It was found that corrosion inhibition efficiency is closely relevant to N vacancy concentration. The ZrN samples with VN near 0.3 had the best corrosion inhibition. The corrosion efficiency is also improved by obtaining the denser films.