High‐Performance, Transparent Thin Film Hydrogen Gas Sensor Using 2D Electron Gas at Interface of Oxide Thin Film Heterostructure Grown by Atomic Layer Deposition. (11th December 2018)
- Record Type:
- Journal Article
- Title:
- High‐Performance, Transparent Thin Film Hydrogen Gas Sensor Using 2D Electron Gas at Interface of Oxide Thin Film Heterostructure Grown by Atomic Layer Deposition. (11th December 2018)
- Main Title:
- High‐Performance, Transparent Thin Film Hydrogen Gas Sensor Using 2D Electron Gas at Interface of Oxide Thin Film Heterostructure Grown by Atomic Layer Deposition
- Authors:
- Kim, Sung Min
Kim, Hye Ju
Jung, Hae Jun
Park, Ji‐Yong
Seok, Tae Jun
Choa, Yong‐Ho
Park, Tae Joo
Lee, Sang Woon - Abstract:
- Abstract: A high‐performance, transparent, and extremely thin (<15 nm) hydrogen (H2 ) gas sensor is developed using 2D electron gas (2DEG) at the interface of an Al2 O3 /TiO2 thin film heterostructure grown by atomic layer deposition (ALD), without using an epitaxial layer or a single crystalline substrate. Palladium nanoparticles (≈2 nm in thickness) are used on the surface of the Al2 O3 /TiO2 thin film heterostructure to detect H2 . This extremely thin gas sensor can be fabricated on general substrates such as a quartz, enabling its practical application. Interestingly, the electron density of the Al2 O3 /TiO2 thin film heterostructure can be tailored using ALD process temperature in contrast to 2DEG at the epitaxial interfaces of the oxide heterostructures such as LaAlO3 /SrTiO3 . This tunability provides the optimal electron density for H2 detection. The Pd/Al2 O3 /TiO2 sensor detects H2 gas quickly with a short response time of <30 s at 300 K which outperforms conventional H2 gas sensors, indicating that heating modules are not required for the rapid detection of H2 . A wide bandgap (>3.2 eV) with the extremely thin film thickness allows for a transparent sensor (transmittance of 83% in the visible spectrum) and this fabrication scheme enables the development of flexible gas sensors. Abstract : A high‐performance, transparent, and extremely thin (≈15 nm) hydrogen (H2 ) gas sensor is developed using 2D electron gas at the interface of an Al2 O3 /TiO2 thin filmAbstract: A high‐performance, transparent, and extremely thin (<15 nm) hydrogen (H2 ) gas sensor is developed using 2D electron gas (2DEG) at the interface of an Al2 O3 /TiO2 thin film heterostructure grown by atomic layer deposition (ALD), without using an epitaxial layer or a single crystalline substrate. Palladium nanoparticles (≈2 nm in thickness) are used on the surface of the Al2 O3 /TiO2 thin film heterostructure to detect H2 . This extremely thin gas sensor can be fabricated on general substrates such as a quartz, enabling its practical application. Interestingly, the electron density of the Al2 O3 /TiO2 thin film heterostructure can be tailored using ALD process temperature in contrast to 2DEG at the epitaxial interfaces of the oxide heterostructures such as LaAlO3 /SrTiO3 . This tunability provides the optimal electron density for H2 detection. The Pd/Al2 O3 /TiO2 sensor detects H2 gas quickly with a short response time of <30 s at 300 K which outperforms conventional H2 gas sensors, indicating that heating modules are not required for the rapid detection of H2 . A wide bandgap (>3.2 eV) with the extremely thin film thickness allows for a transparent sensor (transmittance of 83% in the visible spectrum) and this fabrication scheme enables the development of flexible gas sensors. Abstract : A high‐performance, transparent, and extremely thin (≈15 nm) hydrogen (H2 ) gas sensor is developed using 2D electron gas at the interface of an Al2 O3 /TiO2 thin film heterostructure. This extremely thin gas sensor can be fabricated on general substrates such as a glass using atomic layer deposition, and this fabrication scheme enables the development of flexible gas sensors. … (more)
- Is Part Of:
- Advanced functional materials. Volume 29:Number 7(2019)
- Journal:
- Advanced functional materials
- Issue:
- Volume 29:Number 7(2019)
- Issue Display:
- Volume 29, Issue 7 (2019)
- Year:
- 2019
- Volume:
- 29
- Issue:
- 7
- Issue Sort Value:
- 2019-0029-0007-0000
- Page Start:
- n/a
- Page End:
- n/a
- Publication Date:
- 2018-12-11
- Subjects:
- atomic layer deposition -- gas sensor -- hydrogen -- oxide heterostructure -- thin film
Materials -- Periodicals
Chemical vapor deposition -- Periodicals
620.11 - Journal URLs:
- http://onlinelibrary.wiley.com/journal/10.1002/(ISSN)1616-3028 ↗
http://onlinelibrary.wiley.com/ ↗ - DOI:
- 10.1002/adfm.201807760 ↗
- Languages:
- English
- ISSNs:
- 1616-301X
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 0696.853900
British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 9538.xml