Room-temperature photopatternable low-dielectric cured resins derived from siloxane–carbosilane hybridized polymers. Issue 6 (16th January 2019)

• Record Type: Journal Article
• Authors: Fan, Li; Zhang, Shengbo; Li, Xian; Hu, Huan; Huang, Yawen; Ma, Jiajun; Yang, Junxiao
• Is Part Of: Journal of materials chemistry. Volume 7:Issue 6(2019)
• Page Start: 1518
• Page End: 1524
• Publication Date: 2019-01-16
• Subjects: Materials -- Periodicals; Chemistry, Analytic -- Periodicals; Optical materials -- Research -- Periodicals; Electronics -- Materials -- Research -- Periodicals; 543.0284
• DOI: 10.1039/c8tc04807j
• Languages: English
• ISSNs: 2050-7526

Abstract

Abstract : Siloxane–carbosilane hybridized resins with room-temperature photopatternability, high thermal resistance and a low dielectric constant (2.51–2.74). Abstract : Polycarbosilane-based thermosets exhibit promising low-dielectric properties but relatively low thermal resistance. In this work, to overcome this drawback, siloxane units were incorporated into the main chain of polycarbosilane via hydrolytic condensation to generate oligomers with siloxane–carbosilane hybridized main chains (oligomericPCOSs ). These oligomers enabled subsequent ultraviolet curing via the reaction of disilacyclobutene and thermal curing via the reaction of benzocyclobutene on the pendant groups to form cured resins. The cured resins were photopatternable, and not only showed enhanced thermal resistance compared with that of polycarbosilane-based thermosets, but also maintained outstanding low-dielectric properties.