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HARVARD Citation
Jarvis, K. et al. (2019). Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition. Materials today chemistry. pp. 8-15. [Online].
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Jarvis, K. et al. (2019). Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition. Materials today chemistry. pp. 8-15. [Online].