The effect of a decontamination protocol on contaminated titanium dental implant surfaces with different surface topography in edentulous patients. (2nd January 2019)

• Record Type: Journal Article
• Authors: Alotaibi, Mohammad; Moran, Gary; Grufferty, Brendan; Renvert, Stefan; Polyzois, Ioannis
• Is Part Of: Acta odontologica Scandinavica. Volume 77:Number 1(2019)
• Page Start: 66
• Page End: 75
• Publication Date: 2019-01-02
• Subjects: Decontamination -- titanium -- brush -- edentulous -- implants; Dentistry -- Periodicals; 617.6005
• DOI: 10.1080/00016357.2018.1504986
• Languages: English
• ISSNs: 0001-6357

Abstract

Abstract: Objectives: To investigate if it is possible to achieve complete decontamination of dental implant surfaces with different surface characteristics. Materials and methods: Twelve implant pieces with an Osseotite ® surface and 12 implant pieces with a Ti-Unite ® surface were attached on to the complete lower dentures of six patients and were allowed to accumulate plaque for 30 days. When retrieved, the implant decontamination protocol used, involved both mechanical (PeriBrush™) and chemical (3% H2 O2 ) decontamination. The number of colony forming units per millilitre was determined and the dominant micro-organisms in selected samples was identified by 16s rRNA gene amplicon sequencing. The effect of the titanium brush on the implant surface was examined by SEM. Results: Complete decontamination was achieved in five out of 24 implants (four Osseotite ® and one Ti-Unite ® ). The mean CFU/ml detected after decontamination were 464.48 for Osseotite ® and 729.09 for Ti-Unite ® implants. On the surface of the implants in which complete decontamination was not achieved, all of the predominant bacteria identified were streptococci except for one which was identified as micrococcus. SEM images revealed that the surface features of the decontaminated implants were not significantly altered. Conclusions: Mechanical decontamination using a titanium brush supplemented with chemical treatment for one minute (3% H2 O2 ) can achieve complete decontamination of implant surfaces in edentulous patients.