Amphoteric Aqueous Hafnium Cluster Chemistry. (20th April 2016)

• Record Type: Journal Article
• Authors: Goberna‐Ferrón, Sara; Park, Deok‐Hie; Amador, Jenn M.; Keszler, Douglas A.; Nyman, May
• Is Part Of: Angewandte Chemie. Volume 128:Number 21(2016)
• Page Start: 6329
• Page End: 6332
• Publication Date: 2016-04-20
• Subjects: Clusterverbindungen -- Hafnium -- Kleinwinkel-Röntgenbeugung -- Massenspektrometrie -- Peroxide; Chemistry -- Periodicals; 540
• DOI: 10.1002/ange.201601134
• Languages: English
• ISSNs: 0044-8249

Abstract

Abstract: Selective dissolution of hafnium‐peroxo‐sulfate films in aqueous tetramethylammonium hydroxide enables extreme UV lithographic patterning of sub‐10 nm HfO2 structures. Hafnium speciation under these basic conditions (pH>10), however, is unknown, as studies of hafnium aqueous chemistry have been limited to acid. Here, we report synthesis, crystal growth, and structural characterization of the first polynuclear hydroxo hafnium cluster isolated from base, [TMA]6 [Hf6 (μ‐O2 )6 (μ‐OH)6 (OH)12 ]⋅38 H2 O. The solution behavior of the cluster, including supramolecular assembly via hydrogen bonding is detailed via small‐angle X‐ray scattering (SAXS) and electrospray ionization mass spectrometry (ESI‐MS). The study opens a new chapter in the aqueous chemistry of hafnium, exemplifying the concept of amphoteric clusters and informing a critical process in single‐digit‐nm lithography.