Radiation hardening of silica glass through fictive temperature reduction. (17th April 2017)

• Record Type: Journal Article
• Authors: Lancry, Matthieu; Babu, B. Hari; Ollier, Nadège; Poumellec, Bertrand
• Is Part Of: International journal of applied glass science. Volume 8:Number 3(2017:Sep.)
• Page Start: 285
• Page End: 290
• Publication Date: 2017-04-17
• Subjects: defects -- fiber materials -- fictive temperature -- radiation resistance -- silica; Glass -- Periodicals; Glass manufacture -- Periodicals; 666.1
• DOI: 10.1111/ijag.12271
• Languages: English
• ISSNs: 2041-1286

Abstract

Abstract: The aim of this article was to report the effects of γ‐radiation on type‐I Infrasil silica glass with different fictive temperatures, T f, for harsh environment applications. Radiation‐induced attenuation in the visible range is found to be much lower in low fictive temperature samples. Photoluminescence experiments show that glasses with higher fictive temperatures have a higher nonbridging oxygen hole centers defect concentration generated by irradiation. In addition, electron paramagnetic resonance studies reveal higher E' point defects, AlOHC, and hydrogen(II) defects in high T f samples. In general, we find that the γ‐radiation "hardness" of Infrasil301 silica glass becomes significantly higher with decreasing fictive temperature.