Cite
HARVARD Citation
Kim, S. et al. (2018). Obtaining a Low and Wide Atomic Layer Deposition Window (150–275 °C) for In2O3 Films Using an InIII Amidinate and H2O. Chemistry. 24 (38), pp. 9525-9529. [Online].
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Kim, S. et al. (2018). Obtaining a Low and Wide Atomic Layer Deposition Window (150–275 °C) for In2O3 Films Using an InIII Amidinate and H2O. Chemistry. 24 (38), pp. 9525-9529. [Online].