Cite
HARVARD Citation
Camps, E. et al. (2019). Structural and optical properties of nc-Si in SiOxNy matrix deposited by laser ablation for optoelectronic applications. Materials science in semiconductor processing. pp. 377-382. [Online].
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Camps, E. et al. (2019). Structural and optical properties of nc-Si in SiOxNy matrix deposited by laser ablation for optoelectronic applications. Materials science in semiconductor processing. pp. 377-382. [Online].