Hard Carbon Films Synthesized By Atmospheric Pressure Filamentary Dielectric Barrier Discharge. Issue 1 (19th December 2018)

• Record Type: Journal Article
• Authors: Suzuki, Tetsuya; Shirakura, Akira
• Other Names: Chan Chin Han guestEditor.; Saiter Jean‐Marc guestEditor.
• Is Part Of: Macromolecular symposia. Volume 382:Issue 1(2018)
• Page Start: n/a
• Page End: n/a
• Publication Date: 2018-12-19
• Subjects: amorphous -- atmospheric pressure -- carbon -- hardness -- plasma CVD; Macromolecules -- Congresses; Polymers -- Congresses; Polymerization -- Congresses; Macromolecules -- Periodicals; Polymers -- Periodicals; Polymerization -- Periodicals; 547.705
• DOI: 10.1002/masy.201800084
• Languages: English
• ISSNs: 1022-1360

Abstract

Abstract : To synthesize hydrogenated amorphous carbon (a‐C:H) films, filamentary dielectric discharge (FDBD) is used to improve their mechanical properties compared to the films synthesized by glow dielectric barrier discharge (GDBD), which is generally used for atmospheric pressure‐plasma‐enhanced chemical vapor deposition. The discharge form transitioned from GDBD to FDBD when the gap between the electrodes is increased from 1 to 4 mm. The hardness of the films increased from 3.7 to 11.9 GPa by using FDBD. The results indicate that hard a‐C:H films can be synthesized at room temperature by atmospheric pressure using FDBD.