Lloyd's mirror interference lithography with EUV radiation from a high-harmonic source. (9th June 2016)

• Record Type: Journal Article
• Authors: Kim, Hyun-su; Baksh, Peter; Odstrcil, Michal; Miszczak, Magdalena; Frey, Jeremy G.; Juschkin, Larissa; Brocklesby, William S.
• Is Part Of: Applied physics express. Volume 9:Number 7(2016:Jul.)
• Publication Date: 2016-06-09
• Subjects: Physics -- Periodicals; Technology -- Periodicals; 621.05
• DOI: 10.7567/APEX.9.076701
• Languages: English
• ISSNs: 1882-0778

Abstract

Abstract: We demonstrate interference lithography using a high-harmonic source. Extreme ultraviolet (EUV) radiation is produced by high-harmonic generation with 800 nm light from a femtosecond Ti:sapphire laser (40 fs pulses, 1 kHz, 2 W average power) in argon gas. Interference patterns created using Lloyd's mirror setup and monochromatized radiation at the 27th harmonic (29 nm) are recorded using a ZEP-520A photoresist, producing features with <200 nm pitch. The effect of the use of femtosecond pulsed EUV radiation on the recorded pattern is investigated. The capability of the high-harmonic source for high-resolution patterning is discussed.