2D Nanopatterning: 2D Metal Chalcogenide Nanopatterns by Block Copolymer Lithography (Adv. Funct. Mater. 50/2018). (10th December 2018)

• Record Type: Journal Article
• Authors: Yun, Taeyeong; Jin, Hyeong Min; Kim, Dong‐Ha; Han, Kyu Hyo; Yang, Geon Gug; Lee, Gil Yong; Lee, Gang San; Choi, Jin Young; Kim, Il‐Doo; Kim, Sang Ouk
• Is Part Of: Advanced functional materials. Volume 28:Number 50(2018)
• Page Start: n/a
• Page End: n/a
• Publication Date: 2018-12-10
• Subjects: block copolymer -- nanopattern -- self‐assembly -- sensor -- transition metal dichalcogenide; Materials -- Periodicals; Chemical vapor deposition -- Periodicals; 620.11
• DOI: 10.1002/adfm.201870354
• Languages: English
• ISSNs: 1616-301X

Abstract

Abstract : In article number1804508, Sang Ouk Kim and co‐workers present a reliable and effective nanopatterning strategy for 2D transition metal dichalcogenides via block copolymer (BCP) lithography. By exploiting various BCP templates, diverse nanostructures, including nanomeshes, nanodots, and nanowire arrays, are demonstrated with wafer‐scale scalability. Edge‐exposed MoS2 nanomeshes exhibit superior sensitivity and reversibility for NO2 gas sensing.