Cross-sectional X-ray nano-diffraction and -reflectivity analysis of multilayered AlTiN–TiSiN thin films: Correlation between residual strain and bi-layer period. (October 2015)

• Record Type: Journal Article
• Authors: Bartosik, M.; Arndt, M.; Rachbauer, R.; Krywka, C.; Koller, C.M.; Keckes, J.; Mayrhofer, P.H.
• Is Part Of: Scripta materialia. Volume 107(2015)
• Page Start: 153
• Page End: 156
• Publication Date: 2015-10
• Subjects: Nanobeam -- Multilayer -- Bi-layer period -- Residual strain -- TiSiN/AlTiN; Materials -- Periodicals; Metallurgy -- Periodicals; Metalen; Legeringen; Materiaalkunde; Metals, metalworking and machinery industries; Metals; Electronic journals; 620.11
• DOI: 10.1016/j.scriptamat.2015.06.008
• Languages: English
• ISSNs: 1359-6462

Abstract

Graphical abstract: Abstract: A multi-layered AlTiN–TiSiN thin film with a bi-layer period of ∼6 nm is characterized by cross-sectional synchrotron X-ray nano-diffraction and -reflectivity using an X-ray beam size of 250 × 350 nm 2 . The complementary approach allows for simultaneous determining gradients of residual strains and bi-layer thickness along the film depth and demonstrates a correlation between them. The observed dependency allows for a residual strain gradient design in multilayered thin films.