Substrate topography guides pore morphology evolution in nanoporous gold thin films. (1st January 2016)

• Record Type: Journal Article
• Authors: Chapman, Christopher A.R.; Daggumati, Pallavi; Gott, Shannon C.; Rao, Masaru P.; Seker, Erkin
• Is Part Of: Scripta materialia. Volume 110(2016)
• Page Start: 33
• Page End: 36
• Publication Date: 2016-01-01
• Subjects: Nanoporous material -- Annealing -- Dealloying -- Fracture -- Microfabrication; Materials -- Periodicals; Metallurgy -- Periodicals; Metalen; Legeringen; Materiaalkunde; Metals, metalworking and machinery industries; Metals; Electronic journals; 620.11
• DOI: 10.1016/j.scriptamat.2015.07.039
• Languages: English
• ISSNs: 1359-6462

Abstract

Graphical abstract: Abstract: This paper illustrates the effect of substrate topography on morphology evolution in nanoporous gold (np-Au) thin films. One micron-high silicon ridges with widths varying between 150 nm and 50 μm were fabricated and coated with 500 nm-thick np-Au films obtained by dealloying sputtered gold–silver alloy films. Analysis of scanning electron micrographs of the np-Au films following dealloying and thermal annealing revealed two distinct regimes where the ratio of film thickness to ridge width determines the morphological evolution of np-Au films.